High-performance Single-wafer Processing Atmospheric Pressure CVD (APCVD) System (A200V)
Small quantities and wide varieties. NSG(SiO2)/PSG/BPSG deposition. Single-wafer processing atmospheric pressure CVD (APCVD) system (Compatible with 8-inch SiC wafers)
A200V is a single-wafer processing atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as interlayer insulating deposition, passivation deposition (protective deposition), and sacrificial deposition. 【Features】 ・Ideal for insulating depositions and diffusion/plasma mask depositions. ・Low particle film deposition by single-wafer face-down deposition. ・High safety and deposition stability by using a sealed chamber. ・Wafer warp correction function (patented) for SiC wafers. ・Low-load, long-cycle maintenance. ・Compact cabinet and adjacent installation to the mirror type for space saving. ・Low CoO (low running cost) 【Applications】 ・Interlayer dielectric deposition for power semiconductors (NSG/PSG/BPSG) ・Hard mask for diffusion/ion implantation, Sacrificial depositions (NSG) ・Passivation depositions (protective depositions, insulating depositions) (NSG) ・Optical Waveguide (NSG/BPSG) *For more details, please contact us or download the catalog for further information.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
